Item : TEL CATHODE
Application equipment : Oxide Etcher
Material : SILICON
Process : DRY ETCHING
Application : Used as electrode of tel system for spraying uniformly gas into the chamber
Features
* Excellent properties are highly evaluated by the customers both domestics and abroad.
- No particle during processing
- No contamination during handling
- Keeping high yield in process
- Meet diversified customers requirement of smaller deameter apertures
Contact Information
Company Name
KIRIM SEMITEC CO., LTD.
Contact Person
LEE, JEONG-GEY
Copyright 1996~2011 (c) SBC(Small & medium Business Corporation), All Rights Reserved.
