Item : TEL CATHODE
Application equipment : Oxide Etcher
Material : SILICON
Process : DRY ETCHING
Application : Used as electrode of tel system for spraying uniformly gas into the chamber
* Excellent properties are highly evaluated by the customers both domestics and abroad.
- No particle during processing
- No contamination during handling
- Keeping high yield in process
- Meet diversified customers requirement of smaller deameter apertures
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