* Nitrogen TriFluoride (NF3)
In the production process of semiconductor, insulating and/or conductive layer(film) is made on the surface of wafer. This process is done in CVD Chamber ("Chamver"). Specialty gas put into Chamber makes chemical reaction with wafer to make layer (film) on the surface of wafer. For the next process, Chamber should be cleaned. NF3 put into Chanber makes chemical reaction with remnants
in the Chamber. and, as a result, Chamber is well cleaned
* Silane (SiH4)
SiH4 is used in the chemical vapor deposition of silicon, which is performed on the wafer in the semiconductor industry and on the glass substrate in the TFT-LCD industry. Its demand is also expected to grow up rapidly in the light of competitive expansion from semiconductor and TFT-LCD industries.