HIGH VACUUM OVEN

Payment

T/T
MOQ

Negotiable
Country of sale

World Wide
PRICE
- FOB
  
  Depend on quantity

Description
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ITEM SPECIFICS

Brand

Unbranded
origin

Republic of Korea
Size(Capacity)

Introduction

HIGH VACUUM OVEN (MODEL : TTOVEN-100)

This device is designed and manufactured mainly to aim at stabilizing the deposit film. this device is best suited to provide heat treatment for components which require a high level of stability.

Specification

CHAMBER SIZE	500W * 350D * 540H (Inside) 440W * 330D * 60H (Heating zone)
ULTIMATE PRESSURE	under 5 * 10-6 Torr * 12 hours after degasing
PUMPING SPEED	5 * 10-5 Torr within 20 min (1 CHAMBER ) * room temperature
HEATING TEMPERATURE	MAX. 400℃ NOR. 300℃
HEAT UP TIME	300℃. Approx. 1 hour
HEATING UNIFORMITY	300℃ ±15 ℃

ELECTRIC POWER	AC 220V*, 3 phase, 50Hz, Approx. 30KVA
COMPRESSED AIR	Apporx. 5~7㎏/㎠G
N2 GAS	Apporx. 1㎏/㎠G (Chamber vent & cryo pump regen.)
COOLING WATER	Room temp., Approx. 2 ㎏/㎠G, Approx. 12ℓ/min
LAYOUT	1,600W * 850D * 1,700H (excepted cryo compressor)

SYSTEM FRAME	WITH COVER & CASTER SIZE ; 1,600W * 850D * 1,700H
CHAMBER	500W * 440D * 540H (Inside) : 2 SETS
PUMP	CRYO PUMP (ULVAC) MODEL ; CRYO-U8H OIL ROTARY PUMP
ELECTRICAL CONTROL	FULL AUTOMATIC OPERATIONS BY PLC & TOUCH PANEL
VACUUM GAUGE	2 SETS
HEATER BLOCK, CASE	SUS 304 Each 5 Step : 2 SETS
SHEATH HEATER	Approx. 1.2KW * 6 Step : 2 SETS