Introduction
The DaON-S is R&D equipment for researching the characteristics of thin film and developing
devices to be used for a face-to-face or Co-sputtering system for making in-situ multi-layer thin
film.
It is equipped with two sputter sources at the bottom plate (sputter down type) and a heating unit
that can heat the plate up to 600℃ (radiation type). Its structure facilitates rotation motion to
improve thickness uniformity.

Features
1. Self-made Sputter source
2. Full auto process by PC
3. Process recipe function

Spec
1. Substrate Size: 4 inch
2. DC & RF power
3. Sputter Source: 3 ea.
4. Pressure: 5.0 x 10-6 torr

Model
* DaON-S 1000F : Face to face Sputter
* DaON-S 1000C : Co-sputter

SALES RESULTS
* DaON-S series
- Hanbat university in Korea
- Dongshin university in Korea
- ETRI(Electronics and Telecommunications Research Institute)and more.