Acesol® slurries offer a complete solution for your polishing requirements based on the latest colloidal silica technology showing exceptional stability and high manufacturing reproducibility.
ACESOL -series Colloidal Silica CMP Slurry WP 2010
■Non-agglomerating slurries with tight Particle distributions
■Enables high removal rates
■Low solid contents, excellent uniformity, no defect
■Products development for customized applications
■Individual, non-setting spherical particles
The person in charge
Telephone
82-0538576240Fax
82-53-856-6849Address
1086-3, Buksa-ri, Jain-myeon, Gyeongsan Si, Gyeongsangbuk-do 712-852, Korea, 경상북도,0 / 4000
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