Acesol® slurries offer a complete solution for your polishing requirements based on the latest colloidal silica technology showing exceptional stability and high manufacturing reproducibility.
ACESOL -series Colloidal Silica CMP Slurry WP 2010
￭Non-agglomerating slurries with tight Particle distributions
￭Enables high removal rates
￭Low solid contents, excellent uniformity, no defect
￭Products development for customized applications
￭Individual, non-setting spherical particles
0 / 4000
At least 10~1000 characters.