According to the volume of chamber, productivity is determined.JSPCS series is equipped withJS High Pulse Plasma Power Supply which has been improved from the problems RF(13.56MHz).Plasma Powersupply such as matching trouble by long-term use of plasma chamber or change of substrate so that plasma process time can be reduced up to 30 to 50% than RF.
Model | JSPCS-300 | JSPCS-600 | JSPCS-750 | JSPCS-900 |
M/Z type | standard | standard | standard | standard |
M/Z q'ty | 1 | 6 ~12 | 8 ~16 | 8~16 |
The person in charge
Taeil BaekAddress
17 Emtibeui 25-ro 58beon-gil, Siheung-si, Gyeonggi-do (15117)Please enter the text on the left image to prevent automatic input.
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